Course detail

Surface and Thin Films

FSI-T1T-A Acad. year: 2023/2024 Winter semester

This course is the introduction to series of courses engaged in study of physical problems of two dimensional structures surfaces, interfaces and thin films. Introduction of course is give up to problematic of clean surface: technology for preparation of surfaces and interfaces, its morphology and structure, brief description of two dimensional lattice vibration and electron structure of surface. Following part pay the attention to interaction between surface (interface) and surrounding medium and responsive changes of their physical properties: scattering of particles on solid state surface, kinetics and dynamics of elementary processes on surface (interface) adsorption, diffusion, desorption and sputtering. Last part talks about reactions on solid state surface (heterogenic catalysis), mechanics of thin film growth, properties and applications of thin films (except optical properties).

Language of instruction

English

Number of ECTS credits

6

Entry knowledge

Atomic Physics, Solid State Physics, Quantum Physics, Statistical Physics and Thermodynamics, Vacuum Physics and Technology.

Rules for evaluation and completion of the course

Practice consisting of panels and prepared individually by students under assistance of recommended literature are obligatory. At the examination the performance of students at practising will be taken into account, consultation of teaching materials and textbooks during writing a test is allowed. At the oral part of the exam discussions on problems of surface and interfaces physics will be carried out.
The presence of students at the practice is monitored by a tutor. The way how to compensate missed practice lessons will be decided by a tutor.

Aims

The aim of the module is to provide students with basic ideas of modern surface and interface physics in order to be capable of understanding microscopical nature of matter and principles, which the advanced materials technologies and modern experimental methods are based on.
Students will get knowledge on fundamental phenomena at solid surfaces during thin film growth and on principal analytical methods of surfaces and thin films.

The study programmes with the given course

Programme N-FIN-P: Physical Engineering and Nanotechnology, Master's, compulsory

Type of course unit

 

Lecture

26 hours, optionally

Teacher / Lecturer

Syllabus

I. Physics of two dimensional structures (surfaces and interfaces) and thin films ; definition and impact.
II. Preparation of surfaces and interfaces of defined properties. Ultimate condition ; ultrahigh vacuum (UHV), methods of preparation (cleaving or breaking under UHV, ion bombardment and annealing of a sample, evaporation and molecular beam epitaxy (MBE), epitaxy by chemical reactions and other methods), monitoring of surface quality.
III. Morphology and structure of surfaces and interfaces: Surface tension and macroscopic shape, relaxation, reconstruction and defects, phase transitions, 2D-lattice, superstructure and reciprocal lattice, structural models of solid state interfaces.
IV. Vibration of 2D lattices and surface electronic structure: elementary excitations, work function and methods of its measurement, surface states and the bending of bands at surfaces and interfaces.
V. Scattering at a solid state surface: Kinematic theory of scattering at solid state surface, classical limit of theory of scattering.
VI. Interaction of surfaces/interfaces with surroundings: Physisorption, chemisorption, 2D-phase transitions, work function changes due to adsorption, energy transport on a solid state surface, kinetics and dynamics of elementary processes on a surface – adsorption, diffusion, desorption, sputtering.
VII. Surface reactions and thin film growth: catalysis, nucleation and growth of thin films, in situ study of thin film growth. Properties of thin films.
VIII. Mechanical properties, electrical and magnetic properties (optical properties).
IX. Application of thin films: Improvement of mechanical properties and material protection, application of thin films in electronics and microelectronics, applications in optics, optoelectronics and integrated optics.

Exercise

26 hours, compulsory

Teacher / Lecturer

Syllabus

Panel I: AES, SIMS.
Panel II: EELS
Panel III: XPS/UPS
Panel IV: LEED/RHEED.
Panel V: RBS/LEIS.
Panel VI: Analýza založená na desorbci plynů z povrchu.
Panel VII: SEM a STM/AFM.
Panel VIII: SEXATS.