Course detail
Microscopy and Analysis Using Charged Particles
FSI-9ANC Acad. year: 2024/2025 Winter semester
The course gives a basic overview about electron and ion optical devices for microscopy and lithography. The students obtain a basic overview of charged particle optics (equation of motion, trajectory equation, aberrations in the image, determination of electromagnetic fields used particle optics and their properties, the effects of mutual interactions of particles in the beam). The sources of electron and ion beams are briefly characterized as well as the problems of generation of image and image resolution in microscopy. Finally analytical methods used in microscopy are dealt with (energy and mass spectrometers, X-ray analysis).
Language of instruction
Czech
Supervisor
Department
Entry knowledge
Mathematics, light optics, theory of electromagnetic fields and Fourier methods on the level of MSc courses of physics or physical engineering.
Rules for evaluation and completion of the course
Oral examination with half-an-hour written preparation with possibility of using any literature. During the examination a student shows his orientation in the branch and understanding the topic.
The presence at the practices is obligatory. Absence compensation is laid down by the teacher according to the range of the absented matter.
Aims
The knowledge of theoretical basis of particle optics and instrumentation for electron microscopy (imaging, analysis of samples) and technological applications of charged particle beams.
The knowledge of theoretical basis of particle optics and instrumentation for electron microscopy (imaging, analysis of samples) and technological applications of charged particle beams.
The study programmes with the given course
Programme D-FIN-K: Physical Engineering and Nanotechnology, Doctoral, recommended course
Programme D-FIN-P: Physical Engineering and Nanotechnology, Doctoral, recommended course
Type of course unit
Lecture
20 hours, optionally
Syllabus
Brief characteristics of electron and ion optical devices (microscopes, lithographs); an excursion to laboratories of the Institute of Scientific Instruments AS CR.
Foundations of charged particle optics: the motion of charged particles in homogeneous fields, explanation of the action of magnetic and electrostatic electron lens a deflector.
Trajectory equation, the determination of paraxial optical properties and aberrations. Lagrange equation, matrix methods for the determination of properties of systems.
The computation of fields needed for focusing and deflection of charged particles and determination of their optical properties. The design of electron lenses with modern CAD methods.
The sources of electrons and ions, their properties and consequences for the design of microscopes.
Beam focusing in a scanning electron microscope, the dependence of current in the probe on the probe size, detectors and analytical methods.
Specific problems of generation and processing images in a transmission electron microscope, the resolution of an image.
Analytical methods used in scanning and transmission microscopy, energy and mass spectrometers.