Branch Details
Physical Engineering and Nanotechnology
Original title in Czech: Fyzikální inženýrství a nanotechnologieFSIAbbreviation: M-FINAcad. year: 2018/2019
Programme: Applied Sciences in Engineering
Length of Study: 2 years
Accredited from: 1.9.2003Accredited until: 31.8.2019
Profile
This study program is suitable for absolvent of technically-oriented bachelor study programs with extended education in physics and mathematics. The aim of the program is to prepare students to solve scientific problems from the field of applied physics, construction of scientific instruments and engineering experiments in research laboratories and development centers. The subject of the study program is based on lessons from selected fields of modern physics, applied physics and physical principles of metrology. It also includes courses devoted to different experimental procedures and techniques in selected laboratories and applications of computers for modeling, construction and data analysis.
Key learning outcomes
This study program is suitable for absolvent of technically-oriented bachelor study programs with extended education in physics and mathematics. The aim of the program is to prepare students to solve scientific problems from the field of applied physics, construction of scientific instruments and engineering experiments in research laboratories and development centers. The subject of the study program is based on lessons from selected fields of modern physics, applied physics and physical principles of metrology. It also includes courses devoted to different experimental procedures and techniques in selected laboratories and applications of computers for modeling, construction and data analysis.
Occupational profiles of graduates with examples
The graduates are oriented to the application of optoelectronics in the design of devices and instruments, to qualified usage of optical method in metrology, to the use of new technologies and nanotechnologies and corresponding devices for the surface modification for various purposes, to the use of computers for the design and for scientific calculations. Knowledge of physics and mathematics enables the graduates to work in various engineering areas. During their work on diploma project the students acquire practical experience either in engineering optics or in physics of surfaces and thin films. In engineering optics the student gains theoretical and experimental knowledge of optoelectronics, of sources, propagation and detection of light, of lasers, and of optical elements and systems. He also gets practice in application of general physical principles of measurement and of optical methods and instruments. The study of physics of surfaces and thin films is oriented to technology and analysis of thin films and coatings over materials used in various scientific and industrial disciplines. The student gains theoretical and experimental knowledge of vacuum physics, of sources, optics, and detection of particles. He also gets practice in production of nanostructures and in investigation of their properties. Creative work in modern laboratories is an important part of the study.
Successful and scientifically oriented MSc. graduates in this specialization can continue their studies in the three-years doctoral study programe quot Physical and Material Engineeringquot and acquire the PhD. degree.
Guarantor
Course structure diagram with ECTS credits
Abbreviation | Title | L. | Cr. | Com. | Compl. | Hr. range | Gr. | Op. |
---|---|---|---|---|---|---|---|---|
TAO | Applied Optics | cs | 6 | Compulsory | Cr,Ex | P - 26 / C1 - 12 / C2b - 14 | yes | |
TFV | Physical Properties of Materials | cs | 6 | Compulsory | Cr,Ex | P - 26 / C1 - 26 | yes | |
TPE | Computers in Experiments | cs | 2 | Compulsory | GCr | P - 13 / CPP - 13 | yes | |
T1T-A | Surface and Thin Films | en | 6 | Compulsory | Cr,Ex | P - 26 / C1 - 26 | yes | |
TSI | Advanced Experimental Methods II | cs | 4 | Compulsory | GCr | C2b - 39 | yes | |
TK1 | Design of Instruments I | cs | 5 | Compulsory-optional | Cr,Ex | P - 26 / CPP - 26 | 1 | yes |
TNI | Nanoelectronics | cs | 6 | Compulsory-optional | Cr,Ex | P - 26 / C1 - 20 / CPP - 6 | 1 | yes |
TNF-A | Nanophotonics and Plasmonics | en | 6 | Compulsory-optional | Cr,Ex | P - 26 / C1 - 20 / CPP - 6 | 1 | yes |
TP1 | Precise Mechanics I | cs | 7 | Compulsory-optional | Cr,Ex | P - 26 / CPP - 26 | 1 | yes |
TEB-A | Experimental Biophotonics | en | 3 | Elective (voluntary) | Col | P - 26 / C2b - 13 | yes | |
TP0 | Physical Principles of the Semiconductor Technology | cs | 2 | Elective (voluntary) | Col | P - 39 / P - 39 | yes | |
0F5 | Semestral Project N I | cs | 3 | Elective (voluntary) | GCr | CPP - 26 | yes |
Abbreviation | Title | L. | Cr. | Com. | Compl. | Hr. range | Gr. | Op. |
---|---|---|---|---|---|---|---|---|
TAI | Analysis of Engineering Experiment | cs | 3 | Compulsory | Cr,Ex | P - 26 / CPP - 13 | yes | |
WA1 | Methods of Structure Analysis | cs | 4 | Compulsory | Cr,Ex | P - 39 / C2b - 26 | yes | |
TNM | Numerical Methods of Image Analysis | cs | 4 | Compulsory | Cr,Ex | P - 26 / CPP - 26 | yes | |
0F6 | Semestral (Industrial) Project N II | cs | 5 | Compulsory | GCr | CPP - 65 | yes | |
TFO | Fourier Optics | cs | 4 | Compulsory-optional | Cr,Ex | P - 26 / C1 - 13 | 2 | yes |
TK2 | Design of Instruments II | cs | 4 | Compulsory-optional | Col | P - 13 / CPP - 26 | 2 | yes |
TMT | Nanostructured Materials | cs | 4 | Compulsory-optional | Col | P - 26 / P - 26 / C1 - 10 / C1 - 10 / C2b - 3 / C2b - 3 | 2 | yes |
TP2 | Precise Mechanics II | cs | 4 | Compulsory-optional | Col | P - 13 / CPP - 26 | 2 | yes |
TFM | Fourier Methods in Optics and in Structure Analysis | cs | 3 | Elective (voluntary) | GCr | P - 13 / C1 - 26 | yes | |
0PPT | Industrial Project (M-FIN, M-PMO) | cs | 3 | Elective (voluntary) | GCr | PX - 120 | yes | |
TM0 | Selected Topics in Electron Microscopy | cs | 0 | Elective (voluntary) | Cr | P - 26 / P - 26 | yes |
Abbreviation | Title | L. | Cr. | Com. | Compl. | Hr. range | Gr. | Op. |
---|---|---|---|---|---|---|---|---|
TCO | Particle Optics | cs | 6 | Compulsory | Cr,Ex | P - 26 / C1 - 14 / CPP - 12 | yes | |
TIO | Engineering Optics | cs | 6 | Compulsory | Cr,Ex | P - 26 / C1 - 14 / C2b - 12 | yes | |
TMK | Microscopy and Spectroscopy | cs | 5 | Compulsory | Cr,Ex | P - 26 / C2b - 13 | yes | |
TOI | Optoelectronics and Integrated Optics | cs | 5 | Compulsory | Cr,Ex | P - 26 / C1 - 13 | yes | |
TOJ | Diploma Project I | cs | 5 | Compulsory | Cr | CPP - 65 | yes | |
TSD | Diploma Seminar I (M-FIN, M-PMO) | cs | 3 | Compulsory | Cr | C1 - 26 | yes | |
TP0 | Physical Principles of the Semiconductor Technology | cs | 2 | Elective (voluntary) | Col | P - 39 / P - 39 | yes | |
0F7 | Semestral Project N III | cs | 3 | Elective (voluntary) | GCr | CPP - 26 | yes |
Abbreviation | Title | L. | Cr. | Com. | Compl. | Hr. range | Gr. | Op. |
---|---|---|---|---|---|---|---|---|
TPJ | Diploma Project (M-FIN, M-PMO) | cs | 20 | Compulsory | Cr | VD - 156 / CPP - 52 | yes | |
TSR | Diploma Seminar II (M-FIN, M-PMO) | cs | 3 | Compulsory | Cr | C1 - 13 | yes | |
TSN | Specialised Seminar | cs | 3 | Compulsory | Cr | C1 - 26 | yes | |
TDN | Diagnostics of Nanostructures | cs | 4 | Compulsory-optional | Col | P - 13 / C1 - 14 / CPP - 6 / C2b - 6 | 1 | yes |
TMT | Nanostructured Materials | cs | 4 | Compulsory-optional | Col | P - 26 / P - 26 / C1 - 10 / C1 - 10 / C2b - 3 / C2b - 3 | 1 | yes |
TOV | Technology of Optical Production | cs | 4 | Compulsory-optional | Col | P - 13 / C2b - 26 | 1 | yes |
TM0 | Selected Topics in Electron Microscopy | cs | 0 | Elective (voluntary) | Cr | P - 26 / P - 26 | yes |
Abbreviation | Title | L. | Cr. | Com. | Compl. | Hr. range | Gr. | Op. |
---|---|---|---|---|---|---|---|---|
7AZ | English - Exam B1 | en | 0 | Compulsory | Ex | Z - 1 | yes |
All the groups of optional courses | |||
---|---|---|---|
Gr. | Number of ECTS credits | Number of courses | Courses |
2 | is not being checked | 2 | TFO, TK2, TMT, TP2 |
1 | 12 cr | is not being checked | TK1 (5 cr), TNI (6 cr), TNF-A (6 cr), TP1 (7 cr) |
1 | is not being checked | 1 | TDN, TMT, TOV |