Publication detail

Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films

NEČAS, D. OHLÍDAL, I. FRANTA, D. ČUDEK, V. OHLÍDAL, M. VODÁK, J.

Czech title

Měření rozdělení tloušťky, optických konstant a parametrů drsnosti drsných neuniformních ZnSe tenkých vrstev

English title

Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films

Type

journal article in Web of Science

Language

en

Original abstract

Epitaxial ZnSe thin films exhibiting two important defects, i.e., boundary roughness and thicknessnonuniformity, prepared on GaAs substrates, are optically characterized using a combination of varia-ble-angle spectroscopic ellipsometry, spectroscopic near-normal reflectometry, and imaging spectroscopicreflectometry (ISR). The influence of boundary roughness is incorporated into optical quantity formulasby the Rayleigh–Rice theory. Thickness nonuniformity is included using averaging of the unnormalizedMueller matrices. The dispersion model of the optical constants of the ZnSe films is based on paramet-rization of the joint density of electronic states. Very thin overlayers represented by thin films with iden-tically rough boundaries are taken into account on the upper boundaries of the ZnSe films. Standardoptical techniques are used to determine the spectral dependencies of the optical constants of the ZnSefilms, together with the parameters of roughness and thickness nonuniformity. ISR is then used to findthe maps of the local thickness and local rms value of height irregularities. The values of roughnessparameters, determined using the standard techniques and ISR, are verified by a comparison withresults obtained by atomic force microscopy

Czech abstract

Epitaxní ZnSe tenké vrstvy vykazující dva důležité defekty, tj. drsnost rozhraní a neuniformitu v tloušťce, připravené na GaAs podložkách, jsou opticky charakterizovány kombinací spektroskopické elipsometrie s proměnným úhlem dopadu a zobrazovací spektroskopické reflektometrie (ISR). Vliv drsnosti rozhraní je zahrnut do výrazů pro optické veličiny pomocí Rayleigh-Rice teorie. Neuniformita v tloušťce je zahrnuta použitím nenormalizovaných Muellerových matic. Disperzní model optických konstant ZnSe vrstev je založen na parametrizaci vzájemné hustoty elektronových stavů. Na horních rozhraních ZnSe vrstev jsou uvažovány velmi tenké přechodové vrstvy reprezentované tenkými vrstvami s identicky drsnými rozhraními. K určení spektrálních závislostí optických konstant ZnSe vrstev jsou užity standardní optické techniky. ISR je potom užita k nalezení map lokální tloušťky a lokální RMS hodnoty výškových nerovností. Hodnoty parametrů drsnosti určené pomocí standardních technik a ISR jsou verifikovány srovnáním s výsledky získanými mikroskopií atomových sil.

English abstract

Epitaxial ZnSe thin films exhibiting two important defects, i.e., boundary roughness and thicknessnonuniformity, prepared on GaAs substrates, are optically characterized using a combination of varia-ble-angle spectroscopic ellipsometry, spectroscopic near-normal reflectometry, and imaging spectroscopicreflectometry (ISR). The influence of boundary roughness is incorporated into optical quantity formulasby the Rayleigh–Rice theory. Thickness nonuniformity is included using averaging of the unnormalizedMueller matrices. The dispersion model of the optical constants of the ZnSe films is based on paramet-rization of the joint density of electronic states. Very thin overlayers represented by thin films with iden-tically rough boundaries are taken into account on the upper boundaries of the ZnSe films. Standardoptical techniques are used to determine the spectral dependencies of the optical constants of the ZnSefilms, together with the parameters of roughness and thickness nonuniformity. ISR is then used to findthe maps of the local thickness and local rms value of height irregularities. The values of roughnessparameters, determined using the standard techniques and ISR, are verified by a comparison withresults obtained by atomic force microscopy

Keywords in Czech

Tenké vrstvy, drsnost, elipsometrie a polarimetrie, spektroskopie, zobrazovací systémy

Keywords in English

Thin films; Roughness; Ellipsometry and polarimetry; Spectroscopy, visible; Imaging systems

RIV year

2014

Released

22.08.2014

Publisher

Optical Society of America

Location

Washington DC, USA

ISSN

1559-128X

Volume

53

Number

25

Pages from–to

5606–5614

Pages count

8

BIBTEX


@article{BUT109001,
  author="David {Nečas} and Ivan {Ohlídal} and Daniel {Franta} and Vladimír {Čudek} and Miloslav {Ohlídal} and Jiří {Vodák},
  title="Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films",
  year="2014",
  volume="53",
  number="25",
  month="August",
  pages="5606--5614",
  publisher="Optical Society of America",
  address="Washington DC, USA",
  issn="1559-128X"
}