Publication detail

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

OHLÍDAL, M. OHLÍDAL, I. KLAPETEK, P. JÁKL, M. ČUDEK, V. ELIÁŠ, M.

Czech title

Nová metoda pro úplnou optickou analýzu tenkých vrstev neuniformních v optických konstantách

English title

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Type

journal article - other

Language

en

Original abstract

A new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of reflectance measured using the special experimental arrangement described in detail. Using the method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the film studied.

Czech abstract

Je popsána nová optická metoda pro charakterizaci tenkých vrstev, které vykazují plošnou neuniformitu v optických parametrech. Tato metoda je založena na interpretaci spektrálních závislostí odrazivosti měřených v detailně popsaném speciálním experimentálním uspořádání. Danou metodou může být popsáno plošné rozdělení lokální tloušťky a lokálního indexu lomu studované vrstvy. Metodu lze aplikovat i v případě velmi velkých neuniformit studovaných vrstev. Metoda byla ilustrována na optické analýze silně neuniformních vrstev tvořených směsí CNx a SiOy nanesených na křemíkové monokrystalické substráty.

English abstract

A new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of reflectance measured using the special experimental arrangement described in detail. Using the method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the film studied.

Keywords in English

films nonuniform in optical parameters, optical characterization

RIV year

2003

Released

01.07.2003

ISSN

0021-4922

Journal

Japanese Journal of Applied Physics

Volume

2003

Number

7B

Pages count

4

BIBTEX


@article{BUT42041,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Petr {Klapetek} and Miloš {Jákl} and Vladimír {Čudek} and Marek {Eliáš},
  title="New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters",
  journal="Japanese Journal of Applied Physics",
  year="2003",
  volume="2003",
  number="7B",
  month="July",
  issn="0021-4922"
}