Úplná optická charakterizace neuniformních SiOx vrstev pomocí zobrazovací spektroskopické reflektometrie

Complete Optical Characterization of Non-Uniform SiOx Thin Films Using Imaging Spectroscopic Reflectometry

journal article - other

en

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry. It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants. This is possible because imaging spectroscopic reflectometry enables us to determine the area distributions of local thickness and local refractive index simultaneously in an independent way under the assumption that a suitable dispersion model of the refractive index of the films is used. In this paper the dispersion model corresponding to the Cauchy's formula is used. On the basis of this dispersion model the spectral dependence of the refractive index of the SiOx films is determined. The method presented can be used to characterize the non-uniform films consisting of other non-absorbing materials.

Je provedena úplná optická charakterizace neuniformních SiOx vrstev pomocí zobrazovací spektroskopické reflektometrie. Touto metodou lze určit plošné rozdělení lokální tloušťky zmíněných vrstev při libovolném tvaru neuniformity v tloušťce. Studované vrstvy nevykazovaly plošnou neuniformitu v disperzních parametrech a optických konstantách. Zobrazovací spektroskopická reflektometrie umožňuje určit současně a nezávisle rozdělení lokální tloušťky a indexu lomu, pokud se užije vhodný disperzní model pro index lomu vrstev. V daném článku jsme užili disperzní model odpovídající Cauchyově formuli. Takto byla určena spektrální závislost indexu lomu vrstev. Prezentovanou metodu lze použít i pro vrstvy z jiných neabsorbujících materiálů.

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry. It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants. This is possible because imaging spectroscopic reflectometry enables us to determine the area distributions of local thickness and local refractive index simultaneously in an independent way under the assumption that a suitable dispersion model of the refractive index of the films is used. In this paper the dispersion model corresponding to the Cauchy's formula is used. On the basis of this dispersion model the spectral dependence of the refractive index of the SiOx films is determined. The method presented can be used to characterize the non-uniform films consisting of other non-absorbing materials.

vrstvy; reflexní spektroskopie

Coatings; Reflection spectroscopy

2009

04.04.2009

The Surface Science Society of Japan

Tokyo

1348-0391

e-Journal of Surface Science and Nanotechnology

7

4

409–412

4