Publication detail
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
OHLÍDAL, I. OHLÍDAL, M. NEČAS, D. FRANTA, D. BURŠÍKOVÁ, V.
Czech title
Optická charakterizace SiOxCyHz tenkých vrstev neuniformních v tloušťce použitím spektroskopické elipsometrie, spektroskopické reflektometrie a spektroskopické zobrazovací reflektometrie
English title
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
Type
journal article in Web of Science
Language
en
Original abstract
The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.
Czech abstract
Je popsána kombinovaná optická metoda umožňující provést úplnou optickou charakterizaci slabě absorbujících neuniformních tenkých vrstev. Metoda spočívá v kombinaci standardní spektroskopické elipsometrie s proměnným úhlem, standardní spectroskopické reflektometrie při téměř kolmém dopadu a spektroskopické zobrazovací reflektometrie při kolmém dopadu. Spektrální závislosti optických konstant jsou určeny pomocí nezobrazovacích metod při užití disperzního modelu založeného na parametrizaci hustoty elektronových stavů. Rozdělení lokální tloušťky je pak určeno zobrazovací reflektometrií. Metoda je demonstrována při úplné optické charakterizaci SiOxCyHz tenkých vrstev.
English abstract
The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.
Keywords in Czech
Optická charakterizace; Neuniformní vstvy; Spektroskopická elipsometrie; Spektroskopická reflektometrie; Spektroskopická zobrazovací reflektometrie
Keywords in English
Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry
RIV year
2011
Released
28.02.2011
Publisher
ELSEVIER SCIENCE SA
Location
LAUSANNE
ISSN
0040-6090
Journal
Thin Solid Films
Volume
519
Number
9
Pages from–to
2874–2876
Pages count
3
BIBTEX
@article{BUT50347,
author="Ivan {Ohlídal} and Miloslav {Ohlídal} and David {Nečas} and Daniel {Franta} and Vilma {Buršíková},
title="Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry",
journal="Thin Solid Films",
year="2011",
volume="519",
number="9",
month="February",
pages="2874--2876",
publisher="ELSEVIER SCIENCE SA",
address="LAUSANNE",
issn="0040-6090"
}