Publication detail

Deposition and in situ characterization of ultra-thin films

VOBORNÝ, S. KOLÍBAL, M. MACH, J. ČECHAL, J. BÁBOR, P. PRŮŠA, S. SPOUSTA, J. ŠIKOLA, T.

Czech title

Depozice a in situ charakterizace ultra-tenkých vrstev

English title

Deposition and in situ characterization of ultra-thin films

Type

conference paper

Language

en

Original abstract

Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.

Czech abstract

Depozice ultratenkých vrstev GaN a jejich analýza užitím XPS, SIMS, TOF-LEIS.

English abstract

Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.

Keywords in English

GaN, XPS, thin films

RIV year

2003

Released

23.06.2003

Publisher

EVC

Location

Berlin

Book

EVC'03 Abstracts

Pages count

2

BIBTEX


@inproceedings{BUT11053,
  author="Stanislav {Voborný} and Miroslav {Kolíbal} and Jindřich {Mach} and Jan {Čechal} and Petr {Bábor} and Stanislav {Průša} and Jiří {Spousta} and Tomáš {Šikola},
  title="Deposition and in situ characterization of ultra-thin films",
  booktitle="EVC'03 Abstracts",
  year="2003",
  month="June",
  publisher="EVC",
  address="Berlin"
}