Publication detail

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

VOBORNÝ, S. ZLÁMAL, J. BÁBOR, P.

English title

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Type

conference paper

Language

en

Original abstract

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

English abstract

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Keywords in English

Deposition, Ion source

RIV year

2001

Released

19.09.2001

Publisher

Fakulta strojního inženýrství VUT v Brně

Location

Brno

Book

Juniormat '01 sborník

Pages count

2

BIBTEX


@inproceedings{BUT3359,
  author="Stanislav {Voborný} and Jakub {Zlámal} and Petr {Bábor},
  title="Deposition of Ultrathin Films – Optimalisation of Ion Beam Optics",
  booktitle="Juniormat '01 sborník",
  year="2001",
  month="September",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  address="Brno"
}