Detail publikace

Deposition of Ultrathin Films – Optimalisation of Ion Beam Optics

VOBORNÝ, S. ZLÁMAL, J. BÁBOR, P.

Anglický název

Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

en

Originální abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Anglický abstrakt

Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.

Klíčová slova anglicky

Deposition, Ion source

Rok RIV

2001

Vydáno

19.09.2001

Nakladatel

Fakulta strojního inženýrství VUT v Brně

Místo

Brno

Kniha

Juniormat '01 sborník

Počet stran

2

BIBTEX


@inproceedings{BUT3359,
  author="Stanislav {Voborný} and Jakub {Zlámal} and Petr {Bábor},
  title="Deposition of Ultrathin Films – Optimalisation of Ion Beam Optics",
  booktitle="Juniormat '01 sborník",
  year="2001",
  month="September",
  publisher="Fakulta strojního inženýrství VUT v Brně",
  address="Brno"
}