Publication detail
Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
VOBORNÝ, S. MACH, J. ČECHAL, J. KOSTELNÍK, P. TOMANEC, O. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.
Czech title
Aplikace komplexní UHV aparatury ke studiu nízkoteplotního růstu velmi tenkých vrstev nitridu gallia.
English title
Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
Type
journal article - other
Language
en
Original abstract
Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
Czech abstract
článek se zabývá aplikací komplexní UHV aparatury ke studiu nízkoteplotního růstu velmi tenkých vrstev nitridu gallia.
English abstract
Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
Keywords in English
Ga, GaN, deposition, XPS
RIV year
2004
Released
01.01.2004
ISSN
0447-6441
Journal
Jemná mechanika a optika
Volume
9
Number
9
Pages count
5
BIBTEX
@article{BUT42366,
author="Stanislav {Voborný} and Jindřich {Mach} and Jan {Čechal} and Petr {Kostelník} and Ondřej {Tomanec} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola},
title="Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth",
journal="Jemná mechanika a optika",
year="2004",
volume="9",
number="9",
month="January",
issn="0447-6441"
}