Publication detail

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

RITUCCI, A. –TOMASSETTI, G. –REALE, A. –ARIZZA, L. –ZUPELLA, P. –REALE, L. –PALLADINO, L.–FLORA, F. –BONFIGLI, E. –FAENOV, A. –PIKUZ, T. –KAISER, J. –NILSEN, J. –JANKOWSKI, A.F.

Czech title

Ablace dielektrik pomocí XUV laserového záření na vlnové délce 46,9 nm

English title

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

Type

journal article - other

Language

en

Original abstract

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft X-ray argon laser to ablate the surface of large bandgap dielectrics:CaF2 and LiF crystals.

Czech abstract

Ablace dielektrik pomocí XUV laserového záření na vlnové délce 46,9 nm

English abstract

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft X-ray argon laser to ablate the surface of large bandgap dielectrics:CaF2 and LiF crystals.

Keywords in English

46.9 nm soft X-ray laser, laser ablation

RIV year

2006

Released

01.01.2006

ISSN

0146-9592

Journal

OPTICS LETTERS

Volume

31

Number

1

Pages count

3

BIBTEX


@article{BUT42576,
  author="Jozef {Kaiser},
  title="Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam",
  journal="OPTICS LETTERS",
  year="2006",
  volume="31",
  number="1",
  month="January",
  issn="0146-9592"
}