Publication detail

Low energy focused ion beam milling of silicon and germanium nanostructures

KOLÍBAL, M. MATLOCHA, T. VYSTAVĚL, T. ŠIKOLA, T.

Czech title

Vytváření křemíékových a germaniových nanostruktur pomocí nízkoenergiového fokusovaného iontového svazku.

English title

Low energy focused ion beam milling of silicon and germanium nanostructures

Type

journal article - other

Language

en

Original abstract

In this paper focused ion beam milling of very shallow nanostructures in silicon and germanium by low energy Ga+ ions is studied with respect to ion beam and scanning parameters. It has been found that, using low energy ions, many scanning artefacts can be avoided and, additionally, some physical effects (e.g. redeposition and ion channelling) are significantly suppressed. The structures milled with low energy ions suffer less subsurface ion beam damage (amorphization, formation of voids) and are thus more suitable for selected applications in nanotechnology.

Czech abstract

Článek se zabývá vytvářením křemíékových a germaniových nanostruktur pomocí nízkoenergiového fokusovaného iontového svazku. Jako nejvhodnější se ukazuje použité svazku o nízkých energiích.

English abstract

In this paper focused ion beam milling of very shallow nanostructures in silicon and germanium by low energy Ga+ ions is studied with respect to ion beam and scanning parameters. It has been found that, using low energy ions, many scanning artefacts can be avoided and, additionally, some physical effects (e.g. redeposition and ion channelling) are significantly suppressed. The structures milled with low energy ions suffer less subsurface ion beam damage (amorphization, formation of voids) and are thus more suitable for selected applications in nanotechnology.

Keywords in Czech

FIB; SI; Ge

Keywords in English

FIB milling; Si; Ge

RIV year

2011

Released

02.02.2011

ISSN

0957-4484

Journal

NANOTECHNOLOGY

Volume

22

Number

10

Pages from–to

105304-1–105304-8

Pages count

8

BIBTEX


@article{BUT50636,
  author="Miroslav {Kolíbal} and Tomáš {Matlocha} and Tomáš {Vystavěl} and Tomáš {Šikola},
  title="Low energy focused ion beam milling of silicon and germanium nanostructures",
  journal="NANOTECHNOLOGY",
  year="2011",
  volume="22",
  number="10",
  month="February",
  pages="105304-1--105304-8",
  issn="0957-4484"
}