Publication detail
New method for the complete analysis of thin films non-uniform in optical parameters
OHLÍDAL, M. OHLÍDAL, I. FRANTA, D. ČUDEK, V.
English title
New method for the complete analysis of thin films non-uniform in optical parameters
Type
abstract
Language
en
Original abstract
New method enabling us to perform the complete optical analysis of non-absorbing and weakly absorbing thin films non-uniform in thickness and optical constants is presented. This method is based on interpreting the spectral dependences of the reflectance measured for a sufficient number of points forming a matrix in the mean planes of the boundaries of the film analyzed.
English abstract
New method enabling us to perform the complete optical analysis of non-absorbing and weakly absorbing thin films non-uniform in thickness and optical constants is presented. This method is based on interpreting the spectral dependences of the reflectance measured for a sufficient number of points forming a matrix in the mean planes of the boundaries of the film analyzed.
Keywords in English
Thin films, spectral reflectance
Released
01.10.2002
Publisher
The University of Tokyo, JApan
Location
Tokyo
Book
Asia-Pacific Surface & Interface Analysis Conference
Pages count
1