Publication detail

Application of TOF - LEIS and XPS for Surface Studies.

PRŮŠA, S. ŠIKOLA, T. SPOUSTA, J. VOBORNÝ, S. BÁBOR, P. JURKOVIČ, P. ČECHAL, J.

Czech title

Užití TOF - LEIS a XPS ke studiu povrchů.

English title

Application of TOF - LEIS and XPS for Surface Studies.

Type

conference paper

Language

en

Original abstract

In the contribution complementary experiments on analysis of surfaces using time-of-flight low energy ion scattering (TOF-LEIS) and x-ray photoelectron spectroscopy (XPS) will be presented. The attention will be paid both to analysis of surfaces and ultra-thin films (e.g. Ga) prepared in situ under UHV conditions. The advantages of simultaneous application of two complementary techniques to surface analysis will be clearly demonstrated.

Czech abstract

V příspěvku je popsáno komplementární použití analýz TOF – LEIS a XPS ke studiu povrchů tenkých vrstev.

English abstract

In the contribution complementary experiments on analysis of surfaces using time-of-flight low energy ion scattering (TOF-LEIS) and x-ray photoelectron spectroscopy (XPS) will be presented. The attention will be paid both to analysis of surfaces and ultra-thin films (e.g. Ga) prepared in situ under UHV conditions. The advantages of simultaneous application of two complementary techniques to surface analysis will be clearly demonstrated.

Keywords in English

SIMS, TOF

RIV year

2002

Released

27.06.2001

Publisher

Vutium

Location

Brno

ISBN

80-214-1892-3

Book

Materials Structure & Micromechanics of Fracture (MSMF-3)

Pages count

8

BIBTEX


@inproceedings{BUT6287,
  author="Stanislav {Průša} and Tomáš {Šikola} and Jiří {Spousta} and Stanislav {Voborný} and Petr {Bábor} and Patrik {Jurkovič} and Jan {Čechal},
  title="Application of TOF – LEIS and XPS for Surface Studies.",
  booktitle="Materials Structure & Micromechanics of Fracture (MSMF-3)",
  year="2001",
  month="June",
  publisher="Vutium",
  address="Brno",
  isbn="80-214-1892-3"
}