Ellipsometry - a tool for surface and thin film analysis

článek ve sborníku ve WoS nebo Scopus

en

To study optical properties of solid surfaces under high temperatures we have designed an UHV apparatus consisting of an analytical chamber and a load chamber. The analytical chamber is pumped down by an ion pump to an ultimate background pressure of 10-7–10-8 Pa. Inside the chamber there is a manipulator carrying the substrate holder and oven designed for sample heating up to 1000C. The ellipsometer setup (angle of incidence is 67.5°) is fixed to two windows of the chamber. The paper deals with a basic description of theory, design and testing of a spectroscopic ellipsometer with the light halogen source in a wavelength interval of 350-750 nm and a simple fiber optical spectrometer with a diode array as a detector (Ocean Optics S 2000).

To study optical properties of solid surfaces under high temperatures we have designed an UHV apparatus consisting of an analytical chamber and a load chamber. The analytical chamber is pumped down by an ion pump to an ultimate background pressure of 10-7–10-8 Pa. Inside the chamber there is a manipulator carrying the substrate holder and oven designed for sample heating up to 1000C. The ellipsometer setup (angle of incidence is 67.5°) is fixed to two windows of the chamber. The paper deals with a basic description of theory, design and testing of a spectroscopic ellipsometer with the light halogen source in a wavelength interval of 350-750 nm and a simple fiber optical spectrometer with a diode array as a detector (Ocean Optics S 2000).

Ellipsometry, spectroscopic ellipsometry

2001

19.09.2001

Fakulta strojního inženýrství VUT v Brně

Brno

Juniormat '01 sborník

4