Detail publikace
In situ zobrazovací reflektometrie
URBÁNEK, M. SPOUSTA, J. BĚHOUNEK, T. ŠIKOLA, T.
Český název
In situ zobrazovací reflektometrie
Anglický název
Imaging reflectometery in situ
Typ
článek v časopise - ostatní, Jost
Jazyk
en
Originální abstrakt
An innovative method of in situ real-time optical monitoring of thin film deposition and etching is presented. In this technique, intensity maps of a thin film corresponding to a series of wavelengths selected by a monochromator 300 – 800 nm are recorded by a CCD camera. From the maps the reflectance spectra at individual points of the sample surface can be extracted. By fitting the reflectance spectra to the theoretical ones, the maps of a thin film morphology (including optical parameters) and their temporal development during technological processes can be obtained. The method was tested by in situ observation of the growth of silicon nitride and silicon oxide thin films prepared by ion beam sputtering and by the monitoring of etching of thermally grown SiO2 thin films.
Český abstrakt
In situ zobrazovací reflektometrie
Anglický abstrakt
An innovative method of in situ real-time optical monitoring of thin film deposition and etching is presented. In this technique, intensity maps of a thin film corresponding to a series of wavelengths selected by a monochromator 300 – 800 nm are recorded by a CCD camera. From the maps the reflectance spectra at individual points of the sample surface can be extracted. By fitting the reflectance spectra to the theoretical ones, the maps of a thin film morphology (including optical parameters) and their temporal development during technological processes can be obtained. The method was tested by in situ observation of the growth of silicon nitride and silicon oxide thin films prepared by ion beam sputtering and by the monitoring of etching of thermally grown SiO2 thin films.
Klíčová slova česky
Reflektometrie; Tenké vrstvy; Optická characterizace
Klíčová slova anglicky
Reflectometry; Thin films; Optical characterization
Rok RIV
2007
Vydáno
23.08.2007
ISSN
0003-6935
Časopis
Applied Optics
Ročník
46
Číslo
25
Strany od–do
6309–6313
Počet stran
5
BIBTEX
@article{BUT44051,
author="Michal {Urbánek} and Jiří {Spousta} and Tomáš {Běhounek} and Tomáš {Šikola},
title="Imaging reflectometery in situ",
journal="Applied Optics",
year="2007",
volume="46",
number="25",
month="August",
pages="6309--6313",
issn="0003-6935"
}