Detail publikace
Interfernční litografie využitím kompaktního XUV laseru: systematická studie
ZUPPELLA, P. -LUCIANI, D. -TUCCERI, P. -DeMARCO, P. -GAUDIERI, A. -KAISER, J. -OTTAVIANO, L. -SANTUCCI, S. -REALE, A.
Český název
Interfernční litografie využitím kompaktního XUV laseru: systematická studie
Anglický název
Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence
Typ
článek v časopise - ostatní, Jost
Jazyk
en
Originální abstrakt
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.
Český abstrakt
Ćlánek pojednává o interfernční litografie využitím kompaktního XUV laseru emitujícího na 46.9 nm.
Anglický abstrakt
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.
Klíčová slova česky
XUV litografie, kapilární výboj
Klíčová slova anglicky
XUV interference litography, capillary-discharge based table-top source
Rok RIV
2009
Vydáno
24.02.2009
Nakladatel
IOP PUBLISHING
ISSN
0957-4484
Časopis
NANOTECHNOLOGY
Ročník
20
Číslo
2
Strany od–do
115303–115307
Počet stran
4
BIBTEX
@article{BUT48533,
author="Jozef {Kaiser},
title="Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence",
journal="NANOTECHNOLOGY",
year="2009",
volume="20",
number="2",
month="February",
pages="115303--115307",
publisher="IOP PUBLISHING",
issn="0957-4484"
}