UV-VIS plošná reflektometrie

UV-VIS Areal Reflectometry

audiovizuální tvorba

en

Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 – 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.

Jsou prezentovány první výsledky a konstrukční provedení zařízení pro in-situ plošné zobrazování a sledování optických vlastností neabsorbujících bebo slabě absorbujících tenkých vrstev.

Construction and the first experimental results of the new apparatus for areal imaging of the optical properties of nonabsorbing or weakly absorbing thin films will be presented. The system is based on the principles of the spectroscopic reflectometry[1]; observed sample is illuminated at various wavelengths (selected by a monochromator) in the UV-VIS region and the intensity of the reflected light is detected by a CCD camera. Optical parameters of the thin films 50 – 2000 nm thick can be consequently calculated from the reflectance spectra. Sample size and lateral resolution is customizable and depends on imaging optics. Unique construction allows both, ex situ and in situ measurements, the computer control provides fast measurements and data acqusition. The apparatus can be used for the feedback control of various thin film processing. In the contribution application examples will be presented.

reflectometry; UV; SiO2

25.09.2005

Vienna

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111–111

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